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1

The Atomic Layer Deposition of HfO2 and ZrO2 using Advanced Metallocene Precursors and H2O as the Oxygen Source

Charles L. Dezelah IV, Jaakko Niinistö, Kaupo Kukli, Frans Munnik, Jun Lu, Mikko Ritala, Markku Leskelä, Lauri Niinistö

Journal:

Chemical Vapor Deposition

Année:

2008

Langue:

english

Fichier:

PDF, 385 KB

english, 2008

2

Atomic layer deposition of ZrO2 and HfO2 on deep trenched and planar silicon

Kaupo Kukli, Jaakko Niinistö, Aile Tamm, Jun Lu, Mikko Ritala, Markku Leskelä, Matti Putkonen, Lauri Niinistö, Fuquan Song, Paul Williams, Peter N. Heys

Journal:

Microelectronic Engineering

Année:

2007

Langue:

english

Fichier:

PDF, 3.51 MB

english, 2007

3

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Indrek Jõgi, Tõnis Arroval, Jun Lu, Timo Sajavaara, Mikko Laitinen, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä, John Peck, Jim Natwora, Joan Geary, Ronald Sp

Journal:

Thin Solid Films

Année:

2012

Langue:

english

Fichier:

PDF, 1.53 MB

english, 2012

4

The effect of oxygen source on atomic layer deposited Al2O3 as blocking oxide in metal/aluminum oxide/nitride/oxide/silicon memory capacitors

Nikolaou, Nikolaos, Ioannou-Sougleridis, Vassilios, Dimitrakis, Panagiotis, Normand, Pascal, Skarlatos, Dimitrios, Giannakopoulos, Konstantinos, Kukli, Kaupo, Niinistö, Jaakko, Ritala, Mikko, Leskelä,

Journal:

Thin Solid Films

Année:

2013

Langue:

english

Fichier:

PDF, 906 KB

english, 2013

5

Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates

Kalam, Kristjan, Seemen, Helina, Mikkor, Mats, Jõgiaas, Taivo, Ritslaid, Peeter, Tamm, Aile, Kukli, Kaupo, Kasikov, Aarne, Link, Joosep, Stern, Raivo, Dueñas, Salvador, Castán, Helena

Journal:

Thin Solid Films

Année:

2019

Langue:

english

Fichier:

PDF, 1.31 MB

english, 2019

6

Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition

Kukli, Kaupo, Kemell, Marianna, CastÃ¡n, Helena, DueÃ±as, Salvador, Link, Joosep, Stern, Raivo, HeikkilÃ¤, Mikko J., JÃµgiaas, Taivo, Kozlova, Jekaterina, RÃ¤hn, Mihkel, Mizohata, Kenichiro, Ritala, M

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Année:

2020

Fichier:

PDF, 4.06 MB

2020

7

Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

Kaupo Kukli, Tero Pilvi, Mikko Ritala, Timo Sajavaara, Jun Lu, Markku Leskelä

Journal:

Thin Solid Films

Année:

2005

Langue:

english

Fichier:

PDF, 374 KB

english, 2005

8

Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films

Viljami Pore, Mukesh Dimri, Himani Khanduri, Raivo Stern, Jun Lu, Lars Hultman, Kaupo Kukli, Mikko Ritala, Markku Leskelä

Journal:

Thin Solid Films

Année:

2011

Langue:

english

Fichier:

PDF, 1.56 MB

english, 2011

9

Cycloheptatrienyl-Cyclopentadienyl Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Thin Films

Niinistö, Jaakko, Hatanpää, Timo, Kariniemi, Maarit, Mäntymäki, Miia, Costelle, Leila, Mizohata, Kenichiro, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

Journal:

Chemistry of Materials

Année:

2012

Langue:

english

Fichier:

PDF, 1.77 MB

english, 2012

10

Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes

Part, Marko, Tamm, Aile, Kozlova, Jekaterina, Mändar, Hugo, Tätte, Tanel, Kukli, Kaupo

Journal:

Thin Solid Films

Année:

2014

Langue:

english

Fichier:

PDF, 499 KB

english, 2014

11

Atomic layer deposition of high-k dielectrics on carbon nanoparticles

Tamm, Aile, Peikolainen, Anna-Liisa, Kozlova, Jekaterina, Mändar, Hugo, Aidla, Aleks, Rammula, Raul, Aarik, Lauri, Roosalu, Kaspar, Lu, Jun, Hultman, Lars, Koel, Mihkel, Kukli, Kaupo, Aarik, Jaan

Journal:

Thin Solid Films

Année:

2013

Langue:

english

Fichier:

PDF, 1.11 MB

english, 2013

12

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O

Aarik, Lauri, Alles, Harry, Aidla, Aleks, Kahro, Tauno, Kukli, Kaupo, Niinistö, Jaakko, Mändar, Hugo, Tamm, Aile, Rammula, Raul, Sammelselg, Väino, Aarik, Jaan

Journal:

Thin Solid Films

Année:

2014

Langue:

english

Fichier:

PDF, 1.19 MB

english, 2014

13

High-performance imido–amido precursor for the atomic layer deposition of Ta 2 O 5

Blanquart, Timothee, Longo, Valentino, Niinistö, Jaakko, Heikkilä, Mikko, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

Journal:

Semiconductor Science and Technology

Année:

2012

Langue:

english

Fichier:

PDF, 153 KB

english, 2012

14

Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer deposition

Jõgiaas, Taivo, Zabels, Roberts, Tamm, Aile, Merisalu, Maido, Hussainova, Irina, Heikkilä, Mikko, Mändar, Hugo, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

Journal:

Surface and Coatings Technology

Année:

2015

Langue:

english

Fichier:

PDF, 1.48 MB

english, 2015

15

Growth and phase stabilization of HfO2 thin films by ALD using novel precursors

Jaakko Niinistö, Miia Mäntymäki, Kaupo Kukli, Leila Costelle, Esa Puukilainen, Mikko Ritala, Markku Leskelä

Journal:

Journal of Crystal Growth

Année:

2010

Langue:

english

Fichier:

PDF, 440 KB

english, 2010

16

Atomic layer deposition and characterization of zirconium oxide–erbium oxide nanolaminates

Aile Tamm, Mikko Heikkilä, Marianna Kemell, Jekaterina Kozlova, Kaupo Kukli, Väino Sammelselg, Mikko Ritala, Markku Leskelä

Journal:

Thin Solid Films

Année:

2010

Langue:

english

Fichier:

PDF, 1.34 MB

english, 2010

17

Crystal structures and thermal properties of some rare earth alkoxides with tertiary alcohols

Timo Hatanpää, Kaupo Kukli, Mikko Ritala, Markku Leskelä

Journal:

Journal of Thermal Analysis and Calorimetry

Année:

2011

Langue:

english

Fichier:

PDF, 843 KB

english, 2011

18

Properties of tantalum oxide thin films grown by atomic layer deposition

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Oksana Kohan, Teet Uustare, Väino Sammelselg

Journal:

Thin Solid Films

Année:

1995

Langue:

english

Fichier:

PDF, 963 KB

english, 1995

19

Single band electronic conduction in hafnium oxide prepared by atomic layer deposition

Sergey Shaimeev, Vladimir Gritsenko, Kaupo Kukli, Hei Wong, Eun-Hong Lee, Chungwoo Kim

Journal:

Microelectronics Reliability

Année:

2007

Langue:

english

Fichier:

PDF, 193 KB

english, 2007

20

Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories

Nikolaos Nikolaou, Panagiotis Dimitrakis, Pascal Normand, Vassilios Ioannou-Sougleridis, Konstantinos Giannakopoulos, Konstantina Mergia, Kaupo Kukli, Jaakko Niinistö, Mikko Ritala, Markku Leskelä

Journal:

Solid-State Electronics

Année:

2012

Langue:

english

Fichier:

PDF, 1.79 MB

english, 2012

21

Rare-earth oxide thin films for gate dielectrics in microelectronics

Markku Leskelä, Kaupo Kukli, Mikko Ritala

Journal:

Journal of Alloys and Compounds

Année:

2006

Langue:

english

Fichier:

PDF, 255 KB

english, 2006

22

Substrate Reactivity Effects in the Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum on Ruthenium

Tallarida, Massimo, Kukli, Kaupo, Michling, Marcel, Ritala, Mikko, Leskelä, Markku, Schmeisser, Dieter

Journal:

Chemistry of Materials

Année:

2011

Langue:

english

Fichier:

PDF, 4.31 MB

english, 2011

23

Properties of atomic layer deposited (Ta[sub 1âx]Nb[sub x])[sub 2]O[sub 5] solid solution films and Ta[sub 2]O[sub 5]âNb[sub 2]O[sub 5] nanolaminates

Kukli, Kaupo, Ritala, Mikko, LeskelaÌ, Markku

Journal:

Journal of Applied Physics

Année:

1999

Langue:

english

Fichier:

PDF, 292 KB

english, 1999

24

HfO[sub 2] Films Grown by ALD Using Cyclopentadienyl-Type Precursors and H[sub 2]O or O[sub 3] as Oxygen Source

Niinistö, Jaakko, Putkonen, Matti, Niinistö, Lauri, Arstila, Kai, Sajavaara, Timo, Lu, Jun, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

Journal:

Journal of The Electrochemical Society

Année:

2006

Langue:

english

Fichier:

PDF, 517 KB

english, 2006

25

Holmium and titanium oxide nanolaminates by atomic layer deposition

Kukli, Kaupo, Lu, Jun, Link, Joosep, Kemell, Marianna, Puukilainen, Esa, Heikkilä, Mikko, Hoxha, Roland, Tamm, Aile, Hultman, Lars, Stern, Raivo, Ritala, Mikko, Leskelä, Markku

Journal:

Thin Solid Films

Année:

2014

Langue:

english

Fichier:

PDF, 1.81 MB

english, 2014

26

Holmium titanium oxide thin films grown by atomic layer deposition

Kukli, Kaupo, Kemell, Marianna, Dimri, Mukesh Chandra, Puukilainen, Esa, Tamm, Aile, Stern, Raivo, Ritala, Mikko, Leskelä, Markku

Journal:

Thin Solid Films

Année:

2014

Langue:

english

Fichier:

PDF, 1.04 MB

english, 2014

27

Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films

Niinistö, Jaakko, Kukli, Kaupo, Kariniemi, Maarit, Ritala, Mikko, Leskelä, Markku, Blasco, Nicolas, Pinchart, Audrey, Lachaud, Christophe, Laaroussi, Nadia, Wang, Ziyun, Dussarrat, Christian

Journal:

Journal of Materials Chemistry

Année:

2008

Langue:

english

Fichier:

PDF, 706 KB

english, 2008

28

Atomic Layer Deposition of High-Permittivity Yttrium-Doped HfO[sub 2] Films

Niinistö, Jaakko, Kukli, Kaupo, Sajavaara, Timo, Ritala, Mikko, Leskelä, Markku, Oberbeck, Lars, Sundqvist, Jonas, Schröder, Uwe

Journal:

Electrochemical and Solid-State Letters

Année:

2009

Langue:

english

Fichier:

PDF, 127 KB

english, 2009

29

Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates

Kukli, Kaupo, Ihanus, Jarkko, Ritala, Mikko, Leskela, Markku

Journal:

Applied Physics Letters

Année:

1996

Langue:

english

Fichier:

PDF, 266 KB

english, 1996

30

Properties of Ta[sub 2]O[sub 5]-Based Dielectric Nanolaminates Deposited by Atomic Layer Epitaxy

Journal:

Journal of The Electrochemical Society

Année:

1997

Langue:

english

Fichier:

PDF, 832 KB

english, 1997

31

Properties of HfO[sub 2] Thin Films Grown by ALD from Hafnium tetrakis(ethylmethylamide) and Water

Kukli, Kaupo, Ritala, Mikko, Lu, Jun, Hårsta, Anders, Leskelä, Markku

Journal:

Journal of The Electrochemical Society

Année:

2004

Langue:

english

Fichier:

PDF, 177 KB

english, 2004

32

Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozone

Kukli, Kaupo, Kemell, Marianna, Köykkä, Joel, Mizohata, Kenichiro, Vehkamäki, Marko, Ritala, Mikko, Leskelä, Markku

Journal:

Thin Solid Films

Année:

2015

Langue:

english

Fichier:

PDF, 1.35 MB

english, 2015

33

Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers

Puttaswamy, Manjunath, Vehkamäki, Marko, Kukli, Kaupo, Dimri, Mukesh Chandra, Kemell, Marianna, Hatanpää, Timo, Heikkilä, Mikko J., Mizohata, Kenichiro, Stern, Raivo, Ritala, Mikko, Leskelä, Markku

Journal:

Thin Solid Films

Année:

2016

Langue:

english

Fichier:

PDF, 2.02 MB

english, 2016

34

Quasicubic α-Fe2O3 nanoparticles embedded in TiO2 thin films grown by atomic layer deposition

Tamm, Aile, Seinberg, Liis, Kozlova, Jekaterina, Link, Joosep, Pikma, Piret, Stern, Raivo, Kukli, Kaupo

Journal:

Thin Solid Films

Année:

2016

Langue:

english

Fichier:

PDF, 1.46 MB

english, 2016

35

Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozone

Kukli, Kaupo, Kemell, Marianna, Mizohata, Kenichiro, Vehkamäki, Marko, Kalam, Kristjan, Castán, Helena, Dueñas, Salvador, Link, Joosep, Stern, Raivo, Ritala, Mikko, Leskelä, Markku

Journal:

ECS Journal of Solid State Science and Technology

Année:

2018

Langue:

english

Fichier:

PDF, 1.67 MB

english, 2018

36

Properties of Zirconium Oxide and Cobalt Ferrite Layered Nanocomposite

Tamm, Aile, Joost, Urmas, Mikkor, Mats, Kalam, Kristjan, Mändar, Hugo, Seemen, Helina, Link, Joosep, Stern, Raivo, Castán, Helena, Dueñas, Salvador, Kukli, Kaupo

Journal:

ECS Journal of Solid State Science and Technology

Année:

2017

Langue:

english

Fichier:

PDF, 1.02 MB

english, 2017

37

Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides

Seemen, Helina, Rähn, Mihkel, Kalam, Kristjan, Sajavaara, Timo, Dueñas, Salvador, Castán, Helena, Link, Joosep, Stern, Raivo, Kukli, Kaupo, Tamm, Aile

Journal:

ECS Journal of Solid State Science and Technology

Année:

2018

Langue:

english

Fichier:

PDF, 1.15 MB

english, 2018

38

Niobium Oxide Thin Films Grown by Atomic Layer Epitaxy

Kaupo Kukli, Mikko Ritala, Markku Leskelä, Reijo Lappalainen

Journal:

Chemical Vapor Deposition

Année:

1998

Langue:

english

Fichier:

PDF, 332 KB

english, 1998

39

Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory Applications

Jaakko Niinistö, Kaupo Kukli, Mikko Heikkilä, Mikko Ritala, Markku Leskelä

Journal:

Advanced Engineering Materials

Année:

2009

Langue:

english

Fichier:

PDF, 995 KB

english, 2009

40

Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory Applications (Adv. Eng. Mater. 4/2009)

Jaakko Niinistö, Kaupo Kukli, Mikko Heikkilä, Mikko Ritala, Markku Leskelä

Journal:

Advanced Engineering Materials

Année:

2009

Fichier:

PDF, 502 KB

2009

41

ChemInform Abstract: Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition.

Mikko Ritala, Pia Kalsi, Diana Riihelae, Kaupo Kukli, Markku Leskelae, Janne Jokinen

Journal:

Année:

1999

Fichier:

PDF, 31 KB

1999

42

ChemInform Abstract: Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor.

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Katarina Forsgren, Jonas Sundqvist, Anders Haarsta, Teet Uustare, Hugo Maendar, Alma-Asta Kiisler

Journal:

Année:

2001

Fichier:

PDF, 31 KB

2001

43

Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water.

Kaupo Kukli, Mikko Ritala, Markku Leskelae, Timo Sajavaara, Juhani Keinonen, Anthony C. Jones, Neil L. Tobin

Journal:

Année:

2004

Fichier:

PDF, 56 KB

2004

44

Atomic Layer Deposition of Iron Oxide Thin Films and Nanotubes using Ferrocene and Oxygen as Precursors

Ma˚rten Rooth, Anders Johansson, Kaupo Kukli, Jaan Aarik, Mats Boman, Anders Hårsta

Journal:

Chemical Vapor Deposition

Année:

2008

Langue:

english

Fichier:

PDF, 193 KB

english, 2008

45

Deposition and etching of tantalum oxide films in atomic layer epitaxy process

Jaan Aarik, Aleks Aidla, Kaupo Kukli, Teet Uustare

Journal:

Journal of Crystal Growth

Année:

1994

Langue:

english

Fichier:

PDF, 240 KB

english, 1994

46

Comparison between the electrical properties of atomic layer deposited thin ZrO2 films processed from cyclopentadienyl precursors

Salvador Dueñas, Helena Castán, Héctor García, Alfonso Gómez, Luis Bailón, Kaupo Kukli, Jaakko Niinistö, Mikko Ritala, Markku Leskelä

Journal:

Microelectronic Engineering

Année:

2009

Langue:

english

Fichier:

PDF, 393 KB

english, 2009

47

Hafnium silicon oxide films prepared by atomic layer deposition

Kaupo Kukli, Mikko Ritala, Markku Leskelä, Timo Sajavaara, Juhani Keinonen, David C Gilmer, Philip J Tobin

Journal:

Materials Science and Engineering: B

Année:

2004

Langue:

english

Fichier:

PDF, 107 KB

english, 2004

48

Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Kaupo Kukli, Mikko Ritala, Tero Pilvi, Titta Aaltonen, Jaan Aarik, Markus Lautala, Markku Leskelä

Journal:

Materials Science and Engineering: B

Année:

2005

Langue:

english

Fichier:

PDF, 247 KB

english, 2005

49

Recent developments in the MOCVD and ALD of rare earth oxides and silicates

Anthony C. Jones, Helen C. Aspinall, Paul R. Chalker, Richard J. Potter, Kaupo Kukli, Antti Rahtu, Mikko Ritala, Markku Leskelä

Journal:

Materials Science and Engineering: B

Année:

2005

Langue:

english

Fichier:

PDF, 298 KB

english, 2005

50

Exploitation of atomic layer deposition for nanostructured materials

Markku Leskelä, Marianna Kemell, Kaupo Kukli, Viljami Pore, Eero Santala, Mikko Ritala, Jun Lu

Journal:

Materials Science and Engineering: C

Année:

2007

Langue:

english

Fichier:

PDF, 915 KB

english, 2007